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    巨力科技有限公司
    GiantForce Technology Co., Limited.
    地址:北京市通州区云景东路1号园景国际C-1319[101101]
    Tel:+86-10-57103010 
          +86-10-57299941 
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产品介绍:

催化剂薄膜制备设备

发布者::admin  发布时间: :2013-09-04 18:41  浏览次数: :
产品介绍:
详细说明:

 A vacuum deposition apparatus for depositing metal thin films or catalyst thin films on substrates  with a high degree of accuracy and in a large quantity of samples.

Features:

・ Turbo-molecular pump is equipped so that clean vacuum is realized.

・  All pumping processes run automatically only by pushing the start button.

・ Two kinds of metal sources can be alternately deposited.

・    Highly-sensitive film-thickness monitor is equipped for sub-nanometer thin film deposition.

・ Our unique in-situ rotatable cubic sample holder gives 4 times increase of the yield per lot.

・ Special sample holder for sample preparation in a groove box is also possible optionally, by which samples will never be exposed to the air until the deposition process is finished.

 

Main Specifications:

Vacuum chamber
Pyrex glass chamber 210mmφ150mm.

Substrate holder
360°rotatale cubic substrate holder, 4 faces, 100mmx100mm for each face.

Evaporation source
2 sets of electrodes, 2 evaporation sources. 

Vacuum system
Turbo molecular pump 67L/sec, rotary pump 38L/sec., penning gauge, automatic operation

Degree of vacuum
1×10-4Pa(7.5×10-7Torr)

Film thickness monitor
crystal oscillator, minimum 0.01nm, max. 100nm

Power requirement
220V,  200 Watt 


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