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产品介绍:

纳米压印标准模板:多级光栅

发布者::admin  发布时间: :2011-11-30 16:55  浏览次数: :
产品介绍:
详细说明:

Multi-Pattern

The Multi-Pattern Standard Stamp is optimal for testing of the nanoimprint process and test of of NIL equipment. This standard stamp comes with line widths down to 50 nm. It has 8 areas with 5 different patterns, each with different line widths and periods. The stamp is offered in both Silicon and Quartz.


 
  • Cost-effective stamp for testing
  • Optimal for testing of the nanoimprint process and of NIL equipment
  • 8 active areas
  • 5 different patterns included (meanders, cross-bars, checkers, lines and pillars)
  • Line widths down to 50 nm
  • Suitable for UV and thermal NIL - choose between quartz and silicon
  • Fast delivery time of typically 3 weeks


Specifications

Stamp size 2 inch round wafer
Stamp material Quartz (Fused Silica) or Silicon
Stamp thickness 500 µm +/- 25 µm
Structure size 50 nm - 300 nm
Protrusion height 100 nm +/- 15%
Line width tolerance 50 nm: +/- 30% , 100 nm: +/- 20%, 150-300 nm: +/- 15%
Defect density Less than 0.1% of total patterned area
 
Anti-sticking layer (ASL) and dicing are optional

 


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