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产品介绍:

Si 纳米压印模板

发布者::admin  发布时间: :2011-11-30 17:19  浏览次数: :
产品介绍:
详细说明:

Silicon NIL Stamps

 
NILT fabricates silicon nanoimprint lithography (NIL) stamps with any design specified by customers. The silicon stamps are patterned using electron beam lithography, UV lithography or nanoimprint lithography (NIL). The silicon stamps can be delivered in wafer formats or cut into any square shape.
 
The silicon stamps are often used as molds or masters for fabrication of polymer replicates or for making Nickel shims.
 
NILT supplies silicon nanoimprint lithography (NIL) stamps for many different applications, such as patterning of saphire substrates in LED production, for injection molding of lab-on-a-chip components and for cell studies within biotechnology.

 
Specifications:

 
Stamp material
Silicon
Stamp sizes (wafer)
2", 4", 6"
Stamp sizes (square)
Any square format cut from wafers
Stamp thickness
500 µm (2"), 525 µm (4”), 650 µm (6”)
Minimum lateral dimension
20 nm
Aspect ratio
Up to 1:10 (pattern dependent)
Design
Customer specified
Design file format
gds, dxf, tdb
Anti-sticking
FDTS (optional)
Delivery time
Typically 4 weeks

 


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